Smee lithography

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Shanghai Micro Electronics Equipment Group SMEE , a Chinese developer of lithography tools, announced its first machine capable of processing wafers using a 28nm-class process technology, reports Bloomberg. This advancement represents a major leap in China's quest to close the technological gap in the global chip industry. The announcement did not come without oddities. But after that, the company changed its post and removed any mentions of the 28nm-capable tool, focusing on the fact that SMEE was committed to building advanced lithography machines. This is a bit surprising as SMEE said in October that it would introduce a 28nm-capable lithography tool by the end of the year.

Smee lithography

In the realm of lithography technology, China has been making significant strides towards self-sufficiency in chip production. With the development of ultraviolet UV based lithographic technology at Shanghai Micro Electronic Equipment SMEE , China aimed to produce its own 28nm chips by the end of and 20nm chips by early , without relying on US fabrication technology and equipment. China's progress was hindered when the US, Japan, and the Netherlands initiated restrictions on the sales of advanced wafer fab equipment to Chinese companies. These restrictions, targeting chipmaking gear, which is a weak link in China's semiconductor supply chain, can be seen as a strategic alignment with the US-led "Chip-4 Alliance," aiming to curb China's semiconductor industry. Nevertheless, these restrictions have had an unintended consequence. SMEE, the Chinese leader in lithography gear that was blacklisted by the US, has announced its plans to deliver its first lithography machine based on 28nm technology later this year. It remains unclear whether SMEE can deliver these machines in bulk, as they still rely to some extent on foreign equipment. Even with Japan's recent export control measures for chipmaking equipment, including lithography machines, it is evident that China is likely one of the intended targets. The Dutch government has also announced restrictions on the export of specific advanced semiconductor equipment, affecting SMEE's potential competition with the world-leading lithography machine maker ASML. Chip production is not a task that any one country can accomplish independently. Global cooperation and collaboration are necessary. As Zhang Hong, a semiconductor industry analyst, pointed out, China should seek cooperation with proponents of globalization. The most advanced lithography machines, such as EUV machines, have hundreds of thousands of components, making reliance on the global supply chain essential.

Chip production is not a task that any one country can accomplish independently.

Shanghai Micro Electronics Equipment SMEE , China's most successful lithography scanner manufacturer, reiterated plans this week to deliver its first scanner capable of producing chips on a 28nm-class fabrication process by the end of the year, reports TechWire Asia, citing newspaper Securities Daily , which in turn cites an unnamed source. A 28nm-capable lithography tool will over time enable Chinese chipmakers to rely on domestic lithography equipment for a range of mature technologies. The move is part of China's broader goal to achieve semiconductor self-sufficiency and reduce its dependence on foreign technology. But the question remains as to whether SMEE can produce this scanner in mass quantities, and when it can make such scanners available to substitute for machines from ASML, Canon, and Nikon. The latest export regulations from the U. As a result, China needs advanced domestic lithography tools to ensure that its chipmakers can produce chips on even fairly advanced process technologies, such as 14nm. After it does this, it will still take some time for the chipmaker to integrate the new scanner into its production flow.

Shanghai Micro Electronics Equipment Group SMEE , a state-backed firm, is on track to reveal its first scanner capable of producing chips on a 28nm process technology by the end of , state-controlled the Global Times reports. The machine could help China reduce its dependency on foreign wafer fab equipment, Bloomberg noted. The litho scanner is expected to use locally developed and produced components, which is why the stock price of China-based optical components manufacturers Mloptic, Kingsemi, and Castech were up on Wednesday. Meanwhile, there is still uncertainty about whether the Shanghai-based firm can produce these machines at scale. Details about this technological advancement were not readily available on Wednesday, and the sources of information are the state-owned Global Times and Xinhua News Agency.

Smee lithography

Shanghai Micro Electronics Equipment SMEE , China's most successful lithography scanner manufacturer, reiterated plans this week to deliver its first scanner capable of producing chips on a 28nm-class fabrication process by the end of the year, reports TechWire Asia, citing newspaper Securities Daily , which in turn cites an unnamed source. A 28nm-capable lithography tool will over time enable Chinese chipmakers to rely on domestic lithography equipment for a range of mature technologies. The move is part of China's broader goal to achieve semiconductor self-sufficiency and reduce its dependence on foreign technology. But the question remains as to whether SMEE can produce this scanner in mass quantities, and when it can make such scanners available to substitute for machines from ASML, Canon, and Nikon. The latest export regulations from the U.

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The move is part of China's broader goal to achieve semiconductor self-sufficiency and reduce its dependence on foreign technology. The article requires paid subscription. Global supply chain: China market. It remains unclear whether SMEE can deliver these machines in bulk, as they still rely to some extent on foreign equipment. Meanwhile, the U. After it does this, it will still take some time for the chipmaker to integrate the new scanner into its production flow. Is this 28nm-class scanner capable of producing smaller components or is it strictly capable of producing at 28nm? This will save the password on the computer you're using to access the site. Shanghai Micro Electronics Equipment Group SMEE , a Chinese developer of lithography tools, announced its first machine capable of processing wafers using a 28nm-class process technology, reports Bloomberg. It's the latest development in a tit-for-tat chip war pitting the United States against China: The latest export rules set by the U. But the question remains as to whether SMEE can produce this scanner in mass quantities, and when it can make such scanners available to substitute for machines from ASML, Canon, and Nikon.

Shanghai Micro Electronics Equipment Group SMEE , a Chinese developer of lithography tools, announced its first machine capable of processing wafers using a 28nm-class process technology, reports Bloomberg. This advancement represents a major leap in China's quest to close the technological gap in the global chip industry. The announcement did not come without oddities.

After it does this, it will still take some time for the chipmaker to integrate the new scanner into its production flow. But after that, the company changed its post and removed any mentions of the 28nm-capable tool, focusing on the fact that SMEE was committed to building advanced lithography machines. Dec 14, Subscribe Now. Full access to Tomorrow's Headlines. Please login to read more New users, please register first. Directory News Jobs Marketplace. Fab Construction. US Edition. I am also not aware of any Chinese company that specializes in defect free mirror optics with picometer level tolerances like Carl Zeiss, Nikon, etc. Social Links Navigation. This means you will be required to log-in the next time you visit our site. Nov 6, But the question remains as to whether SMEE can produce this scanner in mass quantities, and when it can make such scanners available to substitute for machines from ASML, Canon, and Nikon.